Photonic microstructures: a key approach for high density integrated optoelectronics

  • R. M. De La Rue
  • , C. J.M. Smith
  • , C. D.W. Wilkinson
  • , T. F. Krauss
  • , H. Benisty
  • , C. Weisbuch
  • , D. Labilloy
  • , R. Houdré
  • , M. Illegems
  • , U. Oesterle

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

One-dimensional and two-dimensional grating structures which, in their in-plane operation, approximate closely to true photonic bandgap behaviour have been fabricated using a combination of high-resolution, direct-write, electron-beam lithography (EBL) and reactive ion etching (REE).
Original languageEnglish
Title of host publicationProceedings of Integrated Photonics Research, IPR 1999
PublisherOptica Publishing Group (formerly OSA)
Pages190-193
Number of pages4
ISBN (Electronic)1557525862
DOIs
Publication statusPublished - 1999
Externally publishedYes
EventIntegrated Photonics Research 1999 - Fess Parker's Doubletree Resort, Santa Barbara, United States
Duration: 19 Jul 199921 Jul 1999

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Conference

ConferenceIntegrated Photonics Research 1999
Abbreviated titleIPR 1999
Country/TerritoryUnited States
CitySanta Barbara
Period19/07/9921/07/99

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials

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