Photonic microstructures: a key approach for high density integrated optoelectronics

R. M. De La Rue, C. J.M. Smith, C. D.W. Wilkinson, T. F. Krauss, H. Benisty, C. Weisbuch, D. Labilloy, R. Houdré, M. Illegems, U. Oesterle

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

One-dimensional and two-dimensional grating structures which, in their in-plane operation, approximate closely to true photonic bandgap behaviour have been fabricated using a combination of high-resolution, direct-write, electron-beam lithography (EBL) and reactive ion etching (REE).
Original languageEnglish
Title of host publicationProceedings of Integrated Photonics Research, IPR 1999
PublisherOptica Publishing Group (formerly OSA)
Pages190-193
Number of pages4
ISBN (Electronic)1557525862
DOIs
Publication statusPublished - 1999
Externally publishedYes
EventIntegrated Photonics Research 1999 - Fess Parker's Doubletree Resort, Santa Barbara, United States
Duration: 19 Jul 199921 Jul 1999

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Conference

ConferenceIntegrated Photonics Research 1999
Abbreviated titleIPR 1999
Country/TerritoryUnited States
CitySanta Barbara
Period19/07/9921/07/99

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials

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