On the mechanism of insulator cleaning using dry ice

Wenjun Zhou; Ming Liu; Shinian   Liu; Mengfei   Peng; Jianhui Yu; Chengke Zhou

doi:10.1109/TDEI.2012.6311520

On the mechanism of insulator cleaning using dry ice

Wenjun Zhou, Ming Liu, Shinian Liu, Mengfei Peng, Jianhui Yu, Chengke Zhou

Research output: Contribution to journal › Article

Abstract

Compared with routine methods, the dry ice cleaning technology is safe, inexpensive, and damage-free. The inherent mechanism on the removal of contaminants from insulators using dry ice is studied in this paper.

Original language	English
Pages (from-to)	1715-1722
Number of pages	8
Journal	IEEE Transactions on Dielectrics and Electrical Insulation
Volume	19
Issue number	5
DOIs	https://doi.org/10.1109/TDEI.2012.6311520
Publication status	Published - Oct 2012

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Keywords

insulators
dry ice cleaning
contamination removal
impact process
sublimation process

Cite this

Zhou, W., Liu, M., Liu, S., Peng, M., Yu, J., & Zhou, C. (2012). On the mechanism of insulator cleaning using dry ice. IEEE Transactions on Dielectrics and Electrical Insulation, 19(5), 1715-1722. https://doi.org/10.1109/TDEI.2012.6311520

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title = "On the mechanism of insulator cleaning using dry ice",

abstract = "Compared with routine methods, the dry ice cleaning technology is safe, inexpensive, and damage-free. The inherent mechanism on the removal of contaminants from insulators using dry ice is studied in this paper.",

keywords = "insulators, dry ice cleaning, contamination removal , impact process, sublimation process",

author = "Wenjun Zhou and Ming Liu and Shinian Liu and Mengfei Peng and Jianhui Yu and Chengke Zhou",

year = "2012",

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doi = "10.1109/TDEI.2012.6311520",

language = "English",

volume = "19",

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TY - JOUR

T1 - On the mechanism of insulator cleaning using dry ice

AU - Zhou, Wenjun

AU - Liu, Ming

AU - Liu, Shinian

AU - Peng, Mengfei

AU - Yu, Jianhui

AU - Zhou, Chengke

PY - 2012/10

Y1 - 2012/10

N2 - Compared with routine methods, the dry ice cleaning technology is safe, inexpensive, and damage-free. The inherent mechanism on the removal of contaminants from insulators using dry ice is studied in this paper.

AB - Compared with routine methods, the dry ice cleaning technology is safe, inexpensive, and damage-free. The inherent mechanism on the removal of contaminants from insulators using dry ice is studied in this paper.

KW - insulators

KW - dry ice cleaning

KW - contamination removal

KW - impact process

KW - sublimation process

U2 - 10.1109/TDEI.2012.6311520

DO - 10.1109/TDEI.2012.6311520

M3 - Article

VL - 19

SP - 1715

EP - 1722

JO - IEEE Transactions on Dielectrics and Electrical Insulation

JF - IEEE Transactions on Dielectrics and Electrical Insulation

SN - 1070-9878

IS - 5

ER -

Documents and Links

10.1109/TDEI.2012.6311520