Fabrication of 65 nm wide split ring resonators by nanoimprint lithography

Graham J. Sharp; Ali Z. Khokhar; Scott G. McMeekin; Nigel P. Johnson

Fabrication of 65 nm wide split ring resonators by nanoimprint lithography

Graham J. Sharp, Ali Z. Khokhar, Scott G. McMeekin, Nigel P. Johnson

SCEBE School Office

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We report on the fabrication of 65 nm wide, high resolution rectangular U-shaped split ring resonators (SRRs) using nanoimprint lithography (NIL). Using both aluminium and gold metal lift-off to construct the structures, we measure an LC resonance peak under transverse electric (TE) conditions at the near ultraviolet range of the visible spectrum. Fabricating the SRRs by NIL rather than conventional electron beam lithography allows them to be scaled to smaller dimensions without any significant loss in resolution, partly because backscattered electrons and the proximity effect are not present with NIL. This in turn helps to shift the magnetic response to lower wavelengths while still retaining a distinct LC peak.

Original language	English
Title of host publication	Proceedings of the International Conference on Micro- and Nano-Photonic Materials and Devices (MINAP 2012)
Subtitle of host publication	Final Conference of the COST Action MP0702
Editors	M. Ferrari, M. Marciniak, G.C. Righini, T. Szoplik, S. Varas
Publisher	National Research Council of Italy (CNR)
Pages	179-182
Number of pages	4
ISBN (Print)	9788377980200
Publication status	Published - 2012

Keywords

metamaterials
nanoimprint lithography
optical resonators
NIL
visible spectrum

Documents and Links

http://minap2012.fbk.eu/proceedings

Cite this

Sharp, G. J., Khokhar, A. Z., McMeekin, S. G., & Johnson, N. P. (2012). Fabrication of 65 nm wide split ring resonators by nanoimprint lithography. In M. Ferrari, M. Marciniak, G. C. Righini, T. Szoplik, & S. Varas (Eds.), Proceedings of the International Conference on Micro- and Nano-Photonic Materials and Devices (MINAP 2012): Final Conference of the COST Action MP0702 (pp. 179-182). National Research Council of Italy (CNR). http://minap2012.fbk.eu/proceedings

Sharp, Graham J. ; Khokhar, Ali Z. ; McMeekin, Scott G. et al. / Fabrication of 65 nm wide split ring resonators by nanoimprint lithography. Proceedings of the International Conference on Micro- and Nano-Photonic Materials and Devices (MINAP 2012): Final Conference of the COST Action MP0702. editor / M. Ferrari ; M. Marciniak ; G.C. Righini ; T. Szoplik ; S. Varas. National Research Council of Italy (CNR), 2012. pp. 179-182

@inproceedings{b4a0b438bafe4f0b9663a7a2612c75c7,

title = "Fabrication of 65 nm wide split ring resonators by nanoimprint lithography",

abstract = "We report on the fabrication of 65 nm wide, high resolution rectangular U-shaped split ring resonators (SRRs) using nanoimprint lithography (NIL). Using both aluminium and gold metal lift-off to construct the structures, we measure an LC resonance peak under transverse electric (TE) conditions at the near ultraviolet range of the visible spectrum. Fabricating the SRRs by NIL rather than conventional electron beam lithography allows them to be scaled to smaller dimensions without any significant loss in resolution, partly because backscattered electrons and the proximity effect are not present with NIL. This in turn helps to shift the magnetic response to lower wavelengths while still retaining a distinct LC peak.",

keywords = "metamaterials, nanoimprint lithography, optical resonators , NIL, visible spectrum",

author = "Sharp, {Graham J.} and Khokhar, {Ali Z.} and McMeekin, {Scott G.} and Johnson, {Nigel P.}",

year = "2012",

language = "English",

isbn = "9788377980200",

pages = "179--182",

editor = "M. Ferrari and M. Marciniak and G.C. Righini and T. Szoplik and { Varas}, S.",

booktitle = "Proceedings of the International Conference on Micro- and Nano-Photonic Materials and Devices (MINAP 2012)",

publisher = "National Research Council of Italy (CNR)",

}

Sharp, GJ, Khokhar, AZ, McMeekin, SG & Johnson, NP 2012, Fabrication of 65 nm wide split ring resonators by nanoimprint lithography. in M Ferrari, M Marciniak, GC Righini, T Szoplik & S Varas (eds), Proceedings of the International Conference on Micro- and Nano-Photonic Materials and Devices (MINAP 2012): Final Conference of the COST Action MP0702. National Research Council of Italy (CNR), pp. 179-182. <http://minap2012.fbk.eu/proceedings>

Fabrication of 65 nm wide split ring resonators by nanoimprint lithography. / Sharp, Graham J.; Khokhar, Ali Z.; McMeekin, Scott G. et al.
Proceedings of the International Conference on Micro- and Nano-Photonic Materials and Devices (MINAP 2012): Final Conference of the COST Action MP0702. ed. / M. Ferrari; M. Marciniak; G.C. Righini; T. Szoplik; S. Varas. National Research Council of Italy (CNR), 2012. p. 179-182.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Fabrication of 65 nm wide split ring resonators by nanoimprint lithography

AU - Sharp, Graham J.

AU - Khokhar, Ali Z.

AU - McMeekin, Scott G.

AU - Johnson, Nigel P.

PY - 2012

Y1 - 2012

N2 - We report on the fabrication of 65 nm wide, high resolution rectangular U-shaped split ring resonators (SRRs) using nanoimprint lithography (NIL). Using both aluminium and gold metal lift-off to construct the structures, we measure an LC resonance peak under transverse electric (TE) conditions at the near ultraviolet range of the visible spectrum. Fabricating the SRRs by NIL rather than conventional electron beam lithography allows them to be scaled to smaller dimensions without any significant loss in resolution, partly because backscattered electrons and the proximity effect are not present with NIL. This in turn helps to shift the magnetic response to lower wavelengths while still retaining a distinct LC peak.

AB - We report on the fabrication of 65 nm wide, high resolution rectangular U-shaped split ring resonators (SRRs) using nanoimprint lithography (NIL). Using both aluminium and gold metal lift-off to construct the structures, we measure an LC resonance peak under transverse electric (TE) conditions at the near ultraviolet range of the visible spectrum. Fabricating the SRRs by NIL rather than conventional electron beam lithography allows them to be scaled to smaller dimensions without any significant loss in resolution, partly because backscattered electrons and the proximity effect are not present with NIL. This in turn helps to shift the magnetic response to lower wavelengths while still retaining a distinct LC peak.

KW - metamaterials

KW - nanoimprint lithography

KW - optical resonators

KW - NIL

KW - visible spectrum

M3 - Conference contribution

SN - 9788377980200

SP - 179

EP - 182

BT - Proceedings of the International Conference on Micro- and Nano-Photonic Materials and Devices (MINAP 2012)

A2 - Ferrari, M.

A2 - Marciniak, M.

A2 - Righini, G.C.

A2 - Szoplik, T.

A2 - Varas, S.

PB - National Research Council of Italy (CNR)

ER -

Sharp GJ, Khokhar AZ, McMeekin SG, Johnson NP. Fabrication of 65 nm wide split ring resonators by nanoimprint lithography. In Ferrari M, Marciniak M, Righini GC, Szoplik T, Varas S, editors, Proceedings of the International Conference on Micro- and Nano-Photonic Materials and Devices (MINAP 2012): Final Conference of the COST Action MP0702. National Research Council of Italy (CNR). 2012. p. 179-182

Fabrication of 65 nm wide split ring resonators by nanoimprint lithography

Abstract

Keywords

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