Fabrication of 65 nm wide split ring resonators by nanoimprint lithography

Graham J. Sharp, Ali Z. Khokhar, Scott G. McMeekin, Nigel P. Johnson

Research output: Chapter in Book/Report/Conference proceedingConference contribution


We report on the fabrication of 65 nm wide, high resolution rectangular U-shaped split ring resonators (SRRs) using nanoimprint lithography (NIL). Using both aluminium and gold metal lift-off to construct the structures, we measure an LC resonance peak under transverse electric (TE) conditions at the near ultraviolet range of the visible spectrum. Fabricating the SRRs by NIL rather than conventional electron beam lithography allows them to be scaled to smaller dimensions without any significant loss in resolution, partly because backscattered electrons and the proximity effect are not present with NIL. This in turn helps to shift the magnetic response to lower wavelengths while still retaining a distinct LC peak.
Original languageEnglish
Title of host publicationProceedings of the International Conference on Micro- and Nano-Photonic Materials and Devices (MINAP 2012)
Subtitle of host publicationFinal Conference of the COST Action MP0702
EditorsM. Ferrari, M. Marciniak, G.C. Righini, T. Szoplik, S. Varas
PublisherNational Research Council of Italy (CNR)
Number of pages4
ISBN (Print)9788377980200
Publication statusPublished - 2012


  • metamaterials
  • nanoimprint lithography
  • optical resonators
  • NIL
  • visible spectrum


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