Abstract
Long term investigation into the production of optically flat low damage surfaces has shown that the most time consuming part of the process is mechanically wear conditioning the polishing surface so that it produces the desired shape on the sample. A completely new concept in polishing systems has been produced which enables the operator to make precise changes to the polishing plate surface shape in resolution steps ranging from 50 nanometers over a 100 mm diameter sample to sub-nanometer increments for a sample of 10mm diameter.
| Original language | English |
|---|---|
| Pages (from-to) | 25-29 |
| Number of pages | 5 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 1573 |
| DOIs | |
| Publication status | Published - 1 Apr 1991 |
| Externally published | Yes |
| Event | Commercial Applications of Precision Manufacturing at the Sub-Micron Level 1991 - London, United Kingdom Duration: 1 Nov 1991 → 7 Nov 1991 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering