Chemomechanical polishing of gallium arsenide to subnanometre surface finish. An evaluation of hydrogen peroxide and dibromine as reagents

Scott G. McMeekin; Max Robertson; Laurence McGheeb; John M. Winfield

doi:10.1039/JM9920200367

Chemomechanical polishing of gallium arsenide to subnanometre surface finish. An evaluation of hydrogen peroxide and dibromine as reagents

Scott G. McMeekin, Max Robertson, Laurence McGheeb, John M. Winfield^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

Hydrogen peroxide is an effective chemical polish for gallium arsenide in the pH range 6-8.5. The polished gallium arsenide surface has a surface roughness of < 1 nm and is superior to that obtained from polishing with dibromine-methanol solutions.

Original language	English
Pages (from-to)	367-368
Number of pages	2
Journal	Journal of Materials Chemistry
Volume	2
Issue number	3
DOIs	https://doi.org/10.1039/JM9920200367
Publication status	Published - 1992
Externally published	Yes

Keywords

Chemornechanical polishing
Gallium arsenide
Hydrogen peroxide

ASJC Scopus subject areas

General Chemistry
Materials Chemistry

Documents and Links

10.1039/JM9920200367

Cite this

@article{228906ad8e5a45b7aeaf772231372892,

title = "Chemomechanical polishing of gallium arsenide to subnanometre surface finish. An evaluation of hydrogen peroxide and dibromine as reagents",

abstract = "Hydrogen peroxide is an effective chemical polish for gallium arsenide in the pH range 6-8.5. The polished gallium arsenide surface has a surface roughness of < 1 nm and is superior to that obtained from polishing with dibromine-methanol solutions.",

keywords = "Chemornechanical polishing, Gallium arsenide, Hydrogen peroxide",

author = "McMeekin, {Scott G.} and Max Robertson and Laurence McGheeb and Winfield, {John M.}",

year = "1992",

doi = "10.1039/JM9920200367",

language = "English",

volume = "2",

pages = "367--368",

journal = "Journal of Materials Chemistry",

issn = "0959-9428",

publisher = "Royal Society of Chemistry",

number = "3",

}

TY - JOUR

T1 - Chemomechanical polishing of gallium arsenide to subnanometre surface finish. An evaluation of hydrogen peroxide and dibromine as reagents

AU - McMeekin, Scott G.

AU - Robertson, Max

AU - McGheeb, Laurence

AU - Winfield, John M.

PY - 1992

Y1 - 1992

N2 - Hydrogen peroxide is an effective chemical polish for gallium arsenide in the pH range 6-8.5. The polished gallium arsenide surface has a surface roughness of < 1 nm and is superior to that obtained from polishing with dibromine-methanol solutions.

AB - Hydrogen peroxide is an effective chemical polish for gallium arsenide in the pH range 6-8.5. The polished gallium arsenide surface has a surface roughness of < 1 nm and is superior to that obtained from polishing with dibromine-methanol solutions.

KW - Chemornechanical polishing

KW - Gallium arsenide

KW - Hydrogen peroxide

U2 - 10.1039/JM9920200367

DO - 10.1039/JM9920200367

M3 - Article

AN - SCOPUS:0043058175

SN - 0959-9428

VL - 2

SP - 367

EP - 368

JO - Journal of Materials Chemistry

JF - Journal of Materials Chemistry

IS - 3

ER -

Chemomechanical polishing of gallium arsenide to subnanometre surface finish. An evaluation of hydrogen peroxide and dibromine as reagents

Abstract

Keywords

ASJC Scopus subject areas

Documents and Links

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